This study introduces an innovative photo-thermoacoustic-diffusion model to explore wave propagation in a hydro-poroelastic semiconductor medium under laser excitation. The model combines photothermal transport principles with mass diffusion and poroelasticity, capturing the interconnected effects of thermal, chemical, and carrier diffusion processes induced by laser heating. Analytical solutions for the primary physical fields within the medium are obtained using the normal mode analysis method. By incorporating the distinctive properties of hydrosemiconductors, such as fluid-saturated pore interactions, the model is particularly suited for studying porous semiconductor materials. The interaction of photo-induced thermal and mechanical waves with diffusion processes is analyzed under specific boundary conditions. Graphical representations of numerical results highlight the influence of critical parameters, showcasing the model’s effectiveness in advancing material understanding and optimization, with potential applications in optoelectronics, photothermal therapy, and semiconductor device design.