Elasto-Thermodiffusion Modeling Using Optoelectronic Microtemperature Processes for a Ramp-Type Heating Nano-Semiconductor Material

Faculty Science Year: 2024
Type of Publication: ZU Hosted Pages:
Authors:
Journal: Journal of Mathematics Wiley Volume:
Keywords : Elasto-Thermodiffusion Modeling Using Optoelectronic Microtemperature Processes    
Abstract:
Te theory of photo-thermoelasticity describes how heating or elastic microstructure mechanical deformation can modify a material’s optical-thermal properties. Tis theory particularly highlights the efect of microtemperature on elasticity and efcient heat transport. Tis work provides a new theoretical framework for thermooptical elastic materials and clarifes the relationship between thermomechanical and plasma waves in microtemperature-afected semiconductors such as silicon. Te model focuses on studying the elasto-thermodifusion (ETD) theory’s electron-hole interaction. Microtemperature efects during photothermal (PT) stimulation are studied in this theory. In one-dimensional (1D) settings, the Laplace transform is utilized which can be solved using the governing equations for thermoelastic (TD) processes and electronic (ED) deformation processes in a nondimensional form. Te proposed model is put to use in analyzing how ramp-type heating afects an unbounded semiconductor material plane at rest. Te discussion section presents a series of graphs to analyze the efect of the main parameters.
   
     
 
       

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