Measurements and Modeling of Hydrogen RF Plasma Discharge

RF Plasma processing is the most widely used chemical process in microelectronic industry for thin film deposition and etching. Its application extends to surface cleaning and modification, flat panel display fabrication, plasma spray, plasma microdischarge and many other rapidly growing areas.We used Langmuir probe for diagnostics coupled capacitive RF hydrogen plasma, we introduced the experiment equipment and the probe measurement system used, we also developed a LabView© program to make the measurements and another one for calculating plasma parameters as Te, ne, EEDF…etc.We had measured the electron temperature and density versus power from 1.2 ~ 50 Watt, pressure from 65 ~ 500 m torr, distance between the electrodes to about 7 cm, and axial measurement between the electrodes. It has been found that the electron density increases with power and pressure, it also increases with the distance. the spatial measurement illustrates a peak in the central bulk and decreasing toward the sheath. The electron temperature expresses no vital change with the power or distance, but decreased with pressure, the spatial measurement gives a saddle shaped.We also introduced a fluid model for comparison. It gives a similar behavior for density and temperature in similar conditions