Applications Of Thin Film Deposition

The thesis includes two main parts, the first one concerns with thetheoretical background of plasma while the second part deals with theexperimental work and the obtained results and their discussion.Valuable information about different types of plasma generation andcharacterization one collected and presented in an attractive way. ParticularlyElectron Cyclotron Resonance (ECR) plasma is explained in some detailssince it is used in deposition of silicon nitride film on the Si sample. Thebackbone of this thesis is the experimental work and the obtained results andtheir discussion.An electron cyclotron resonance (ECR) system is set up from itsdifferent components such as magnetron as a source of microwave radiation,water-cooled coils to produce high magnetic field, discharge chamber ,vacuum system, and system to feed different gases with the pre-controlledflow rate in the discharge chamber.The needed magnetic field required to produce the desired electroncyclotron resonance (ECR) plasma is calculated. The double electric probesystem is used to measure the electron temperature and ion density.Silicon nitride film was formed on the surface of a Si sample at thefollowing plasma conditions: microwave frequency 2.45 GHz, microwavepower (-200 W), and discharge pressure 3.8 to 4.4 mTorrs.