Electrochemical behaviour of copper in aqueous solution in the presence of some organic additives

This thesis deals with the study of the effect of different organic aldehydes on the electropolishing of copper in H3PO4 by measuring the limiting current and weight loss. This thesis includes three parts: The first chapter includes, the introduction, whiThe general correlations in presence of organic substance were:1- For formaldehyde : Sh = 0.1935 Re 0.7176 (Sc)0.332- For acetaldehyde : Sh = 0.2608 Re 0.7175 (Sc)0.33csc)0.333-For paraldehyde : Sh = 0.2541 Re 0.7171 (Sc)0.334-For salicyladehyde: Sh = 0.2465 Re 0.7164 (Sc)0.335- For benzaldehyde : Sh = 0.2615 Re 0.7202 (Sc)0.336- For anisaldehyde : Sh = 0.2451 Re 0.717 (Sc)0.337- For tolualdehyde : Sh = 0.2535 Re 0.7183 (Sc)0.33The dissolution of copper in H3PO4 with and without organic additives is measure by weight loss method. It found that the rate of inhibition in this case is nearly the same.